MgxZnO1-x photodetector grown by chemical spraying pyrolysis technique | |
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( Volume 2 Issue 8,August 2016 ) OPEN ACCESS | |
Author(s): | |
Abdulazeez O. Mousa, Saleem H. Trier | |
Abstract: | |
In this research was prepared MgxZnO1-x/n-Si photodetector by using chemical spraying pyrolysis (CSP) technique, and different proportions volumetric ofMg-contents (0,30,50,70,and 90)%,at a temperature of (450)°C, were constant thickness by fixing a number sprinkles and was thickness of all films ranges between(80±5)nm, nitrogen gas under pressure (4.5) bar was used. The crystal structure was examined using X-ray diffraction (XRD). The results showed that all the films of polycrystalline. As was studied the topography of the surface of the films by using field emission scanning electron microscopy (FESEM), and energy dispersive X-ray (EDS), where decreases grain size with adding Mg-content. As well as that add MgO in the films lead to a decrease in surface roughness. Also, (EDS) showed that the films contain elements (Si, N, O, Zn, and Mg) as expected. As were studied topography of the surface of the films by using atomic force microscopy (AFM), and showed that the grain size of the ZnO nanostructure depends on the ratio of Mg-content of volumetric, where decreases the grain size with increasing Mg-content. As well as the increase in the proportion of Mg-content in the films lead to a decrease in surface roughness. In this work we studied the spectral properties of the MgxZnO1-x/n-Si photodetector, and found that the values of the spectral response, quantum efficiency, and specific detectivity increases and shift toward the wavelengths higher. While the equivalent power of the noise increases randomly, with increase Mg-content. |
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